1. Research
  2. Publications
  3. Correlated mode analysis of a ...

Publications

Find scientific contributions

to conferences also on our events page.

Correlated mode analysis of a microwave driven ICP source

H.-E. Porteanu1, I. Stefanovic2,3, N. Bibinov2, M. Klute4, P. Awakowicz2, R.-P. Brinkmann4 and W. Heinrich1

Published in:

Plasma Sources Sci. Technol., vol. 28, no. 03, pp. 035013 (2019).

Abstract:

Microwave and optical measurements are correlated to identify the mode evolution in a miniature, microwave driven, inductively coupled plasma(ICP)source. The very compact design of the source is derived from previous work (Porteanu et al 2013 Plasma Sources Sci.Technol. 22 035016). Microwave spectroscopy of the system resonances during the simultaneous microwave excitation of the plasma (‘Hot-S-Parameter’ spectroscopy) is a novel method to determine the electron density and to identify the type of coupling mode. The method corresponds directly to the kind of numerical simulations employed. The purpose of this analysis is finally to find the minimum power necessary to drive the source into the ICP mode. The efficiency of microwave energy transfer to the plasma is also discussed. Nitrogen at pressures between 50 and 1000 Pa and a gasflow of 150 sccm is used as test plasma, for which the electron density is determined. Analysis of the microwave resonance frequency shows that the electron density exceeds 1019m-3 at 50 Pa for 11 W and at 1000 Pa for 26 W absorbed power. 3D theoretical analysis of this source confirms that at this electron density an ICP mode is present.

1 Ferdinand-Braun-Institut, Leibniz-Institut für Höchstfrequenztechnik, Berlin, Germany
2 Ruhr-Universität Bochum, Faculty of Electrical Engineering and Information Technology, Institute for Electrical Engineering and Plasma Technology, Germany
3 Serbian Academy for Sciences and Arts, Institute for Technical Sciences, Belgrade, Serbia
4 Ruhr-Universität Bochum, Faculty of Electrical Engineering and Information Technology, Institute for Theoretical Electrical Engineering, Germany

Keywords:

ICP, microwaves, plasma jet

Copyright © 2019 IOP Publishing Ltd. Personal use of this material is permitted. However, permission to reprint/republish this material for advertising or promotional purposes or for creating new collective works for resale or redistribution to servers or lists, or to reuse any copyrighted component of this work in other works must be obtained from the IOP Publishing Ltd..

Full version in pdf-format.